• DocumentCode
    1660041
  • Title

    Optimization considerations for 4 μm SOI-waveguide technology with respect to polarization dependence

  • Author

    Zimmermann, L. ; Voigt, K. ; Winzer, G. ; Bruns, J. ; Petermann, K.

  • Author_Institution
    Inst. fur Hochfrequenz-und Halbleiter-Systemtechnologien, Tech. Univ. Berlin, Berlin
  • fYear
    2007
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    The geometry of 4 μm silicon rib waveguides was optimized to reduce sensitivity of modal birefringence to process & substrate nonuniformities. Similar birefringence uniformities have been demonstrated experimentally on BESOI and SmartCut material.
  • Keywords
    birefringence; light polarisation; optical waveguides; rib waveguides; silicon-on-insulator; BESOI; SOI waveguide; Si; SmartCut material; modal birefringence; optimization; silicon rib waveguides; size 4 mum; Birefringence; Costs; Etching; Geometry; Lithography; Optical fiber polarization; Optical waveguides; Scanning electron microscopy; Silicon on insulator technology; Space technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics, 2007 4th IEEE International Conference on
  • Conference_Location
    Tokyo
  • Print_ISBN
    978-1-4244-0934-1
  • Type

    conf

  • DOI
    10.1109/GROUP4.2007.4347706
  • Filename
    4347706