DocumentCode
1660041
Title
Optimization considerations for 4 μm SOI-waveguide technology with respect to polarization dependence
Author
Zimmermann, L. ; Voigt, K. ; Winzer, G. ; Bruns, J. ; Petermann, K.
Author_Institution
Inst. fur Hochfrequenz-und Halbleiter-Systemtechnologien, Tech. Univ. Berlin, Berlin
fYear
2007
Firstpage
1
Lastpage
3
Abstract
The geometry of 4 μm silicon rib waveguides was optimized to reduce sensitivity of modal birefringence to process & substrate nonuniformities. Similar birefringence uniformities have been demonstrated experimentally on BESOI and SmartCut material.
Keywords
birefringence; light polarisation; optical waveguides; rib waveguides; silicon-on-insulator; BESOI; SOI waveguide; Si; SmartCut material; modal birefringence; optimization; silicon rib waveguides; size 4 mum; Birefringence; Costs; Etching; Geometry; Lithography; Optical fiber polarization; Optical waveguides; Scanning electron microscopy; Silicon on insulator technology; Space technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2007 4th IEEE International Conference on
Conference_Location
Tokyo
Print_ISBN
978-1-4244-0934-1
Type
conf
DOI
10.1109/GROUP4.2007.4347706
Filename
4347706
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