DocumentCode :
1660617
Title :
Charge transport model of gate solution AlGaN/GaN high electron mobility transistors
Author :
Asgari, Asghar ; Bonab, L. Rajabi
Author_Institution :
Res. Inst. for Appl. Phys., Univ. of Tabriz, Tabriz, Iran
fYear :
2010
Firstpage :
664
Lastpage :
665
Abstract :
In this article, a transport model of gate solution AlGaN/GaN high electron mobility transistor has been developed that is capable of accurately predicting the sensitivity of the drain current as well as small-signal parameters such as drain conductance, device transconductance and cutoff frequency to PH values of the electrolyte and to charged adsorbents at the semiconductor-electrolyte interface. This model built up with incorporation of fully and partially occupied sub-bands in the interface quantum well, combined with a numerically self-consistent solution of the Schrodinger and Poisson equations. In addition, the polarization effects, and self-heating are also taken into account.
Keywords :
III-V semiconductors; Poisson equation; Schrodinger equation; aluminium compounds; electrolytes; gallium compounds; high electron mobility transistors; semiconductor quantum wells; two-dimensional electron gas; wide band gap semiconductors; AlGaN-GaN; Poisson equation; Schrodinger equation; charge transport model; cutoff frequency; device transconductance; drain conductance; drain current sensitivity; gate solution; high electron mobility transistors; interface quantum well; polarization effects; semiconductor-electrolyte interface; Aluminum gallium nitride; Electron mobility; Gallium nitride; HEMTs; MODFETs; Photonics; Poisson equations; Polarization; Predictive models; Semiconductor materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
Type :
conf
DOI :
10.1109/INEC.2010.5424659
Filename :
5424659
Link To Document :
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