DocumentCode :
1661021
Title :
Analysis and modeling of nano-crystalline silicon TFTs on flexible substrate with mechanical strain
Author :
Lee, M.H. ; Chang, S.T. ; Huang, J.-J. ; Hu, G.-R. ; Huang, Y.-S. ; Lee, C.-C.
Author_Institution :
Inst. of Electro-Opt. Sci. & Technol., Nat. Taiwan Normal Univ., Taipei, Taiwan
fYear :
2010
Firstpage :
654
Lastpage :
655
Abstract :
The gap state density of nano-crystalline silicon active layer on flexible substrate will be redistributed with mechanical bending. The weak or broken bonds may contribute to the redistribution of trap states. During mechanical strain the deep states are redistributed in a Gaussian distribution, and are dissimilar to ordinary acceptor-like deep states which manifest with exponential distributions. We conclude that the DOS with TCAD modeling under mechanical strain is the fundamental reliability issue for the development of flexible electronics.
Keywords :
Gaussian distribution; bending; deep levels; flexible electronics; nanostructured materials; silicon; thin film transistors; Gaussian distribution; Si; TCAD modeling; deep states; flexible electronics; flexible substrate; gap state density; mechanical bending; mechanical strain; nanocrystalline silicon; thin film transistors; trap states edistribution; Amorphous materials; Capacitive sensors; Crystalline materials; Fabrication; Glass; Materials science and technology; Silicon; Solvents; Substrates; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
Type :
conf
DOI :
10.1109/INEC.2010.5424674
Filename :
5424674
Link To Document :
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