Title :
Application of SEMATECH Defect Model to a 0.6 μm process defect reduction
Author :
Saha, Sujit ; Mittal, Sanjiv ; McDonald, Chris
Author_Institution :
Intel Corp., Santa Clara, CA, USA
Abstract :
Summary form only given. This paper will describe the application of the SEMATECH Defect Model for setting equipment level goals for a new 8" process technology at the inception of the process development. The paper will also show how the model validation was made using a similar process and sort yield visual data, how those goals were used to drive equipment team level improvements and resulting die yield impacts. We will also show how the model results can be used to prioritize competing improvement projects for the highest overall output
Keywords :
semiconductor process modelling; 0.6 micron; 8 in; SEMATECH defect model; defect reduction; die yield; equipment level; process development; process technology; semiconductor industry; sort visual data; Conference management; Costs; Educational institutions; Electronics industry; Predictive models; Production facilities; Semiconductor device manufacture; Strategic planning; Virtual manufacturing;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop. 1994 IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-2053-0
DOI :
10.1109/ASMC.1994.588271
