Application of SEMATECH Defect Model to a 0.6 μm process defect reduction

Summary form only given. This paper will describe the application of the SEMATECH Defect Model for setting equipment level goals for a new 8" process technology at the inception of the process development. The paper will also show how the model validation was made using a similar process and sort yield visual data, how those goals were used to drive equipment team level improvements and resulting die yield impacts. We will also show how the model results can be used to prioritize competing improvement projects for the highest overall output