DocumentCode
1663981
Title
Stylus profiler monitors chemical mechanical planarization performance
Author
Reilly, John
Author_Institution
Tencor Instrum., Mountain View, CA, USA
fYear
1994
Firstpage
320
Lastpage
322
Abstract
This paper describes the use of stylus-based surface profilers in advanced semiconductor device manufacturing to monitor chemical mechanical planarization (CMP) performance
Keywords
surface topography measurement; chemical mechanical planarization; semiconductor device manufacturing; stylus; surface profiling; Dielectric materials; Dielectric measurements; Inorganic materials; Optical films; Optical materials; Planarization; Semiconductor device manufacture; Semiconductor films; Silicon; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop. 1994 IEEE/SEMI
Conference_Location
Cambridge, MA
Print_ISBN
0-7803-2053-0
Type
conf
DOI
10.1109/ASMC.1994.588289
Filename
588289
Link To Document