Title :
Size effects of microstructure during plasma immersion ion implantation
Author :
Gong, Chunzhi ; Wang, Zhijian ; Tian, Xiubo ; Yang, Shiqin
Author_Institution :
State Key Lab. of Adv. Welding Production & Technol., Harbin Inst. of Technol., Harbin, China
Abstract :
Plasma immersion ion implantation (PBII) has been regarded as an effective tool to enhance surface properties. The implantation dynamics during plasma ion implantation of small component used in micro-electromechanical systems (MEMS) has seldom been investigated. Numerical simulation of PBII by Particle-in-cell/Monte Carlo collision method has been launched to understand the effect of small target dimension. As the characteristic size of the component decreases, the electric field strength near the top surface increases and the thickness of plasma sheath also decreases with a higher impact energy. In summary the implantation efficiency increases significantly.
Keywords :
Monte Carlo methods; ion implantation; micromechanical devices; plasma materials processing; MEMS; Monte Carlo collision method; electric field strength; impact energy; implantation dynamics; micro-electromechanical systems; microstructure; numerical simulation; particle-in-cell; plasma immersion ion implantation; plasma sheath; size effects; surface properties; Ion implantation; Microelectromechanical systems; Micromechanical devices; Microstructure; Monte Carlo methods; Numerical simulation; Plasma immersion ion implantation; Plasma properties; Plasma sheaths; Plasma simulation;
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
DOI :
10.1109/INEC.2010.5424795
