Size effects of microstructure during plasma immersion ion implantation

Author

Gong, Chunzhi ; Wang, Zhijian ; Tian, Xiubo ; Yang, Shiqin

Author_Institution

State Key Lab. of Adv. Welding Production & Technol., Harbin Inst. of Technol., Harbin, China

fYear

2010

Firstpage

1451

Lastpage

1452

Abstract

Plasma immersion ion implantation (PBII) has been regarded as an effective tool to enhance surface properties. The implantation dynamics during plasma ion implantation of small component used in micro-electromechanical systems (MEMS) has seldom been investigated. Numerical simulation of PBII by Particle-in-cell/Monte Carlo collision method has been launched to understand the effect of small target dimension. As the characteristic size of the component decreases, the electric field strength near the top surface increases and the thickness of plasma sheath also decreases with a higher impact energy. In summary the implantation efficiency increases significantly.

Keywords

Monte Carlo methods; ion implantation; micromechanical devices; plasma materials processing; MEMS; Monte Carlo collision method; electric field strength; impact energy; implantation dynamics; micro-electromechanical systems; microstructure; numerical simulation; particle-in-cell; plasma immersion ion implantation; plasma sheath; size effects; surface properties; Ion implantation; Microelectromechanical systems; Micromechanical devices; Microstructure; Monte Carlo methods; Numerical simulation; Plasma immersion ion implantation; Plasma properties; Plasma sheaths; Plasma simulation;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanoelectronics Conference (INEC), 2010 3rd International

Conference_Location

Hong Kong

Print_ISBN

978-1-4244-3543-2

Electronic_ISBN

978-1-4244-3544-9

Type

conf

DOI

10.1109/INEC.2010.5424795

Filename

5424795