DocumentCode
1664184
Title
Influence of chemical structure in styrene copolymers subjected to partial discharges
Author
Gustafsson, A. ; Gedde, U.W.
Author_Institution
Dept. of Polymer Technol., R. Inst. of Technol., Stockholm, Sweden
fYear
1989
Firstpage
448
Lastpage
450
Abstract
The authors present data on the PD (partial discharge) resistance of styrene copolymers containing a number of different styrene monomers with electron-withdrawing and electron-donating substituents. The presence of pentafluorostyrene (PFS) in the polymer chain is shown to have a clearly negative influence on the resistance to PD. Preliminary results show that polystyrene itself has a very good stability with respect to PD. The electron-donating p-methoxystyrene monomer has a clearly negative influence on the PD stability. P-methylstyrene and p-chlorostyrene do not differ appreciably from styrene regarding PD resistance
Keywords
chemical structure; electric breakdown of solids; organic insulating materials; partial discharges; polymer blends; polymer structure; P-methylstyrene; chemical structure; p-chlorostyrene; p-methoxystyrene; partial discharges; pentafluorostyrene; styrene copolymers; Absorption; Additives; Chemical compounds; Electrons; Insulation; Partial discharges; Polymer films; Solvents; Voltage; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Conduction and Breakdown in Solid Dielectrics, 1989., Proceedings of the 3rd International Conference on
Conference_Location
Trondheim
Type
conf
DOI
10.1109/ICSD.1989.69238
Filename
69238
Link To Document