Title :
Influence of chemical structure in styrene copolymers subjected to partial discharges
Author :
Gustafsson, A. ; Gedde, U.W.
Author_Institution :
Dept. of Polymer Technol., R. Inst. of Technol., Stockholm, Sweden
Abstract :
The authors present data on the PD (partial discharge) resistance of styrene copolymers containing a number of different styrene monomers with electron-withdrawing and electron-donating substituents. The presence of pentafluorostyrene (PFS) in the polymer chain is shown to have a clearly negative influence on the resistance to PD. Preliminary results show that polystyrene itself has a very good stability with respect to PD. The electron-donating p-methoxystyrene monomer has a clearly negative influence on the PD stability. P-methylstyrene and p-chlorostyrene do not differ appreciably from styrene regarding PD resistance
Keywords :
chemical structure; electric breakdown of solids; organic insulating materials; partial discharges; polymer blends; polymer structure; P-methylstyrene; chemical structure; p-chlorostyrene; p-methoxystyrene; partial discharges; pentafluorostyrene; styrene copolymers; Absorption; Additives; Chemical compounds; Electrons; Insulation; Partial discharges; Polymer films; Solvents; Voltage; Wire;
Conference_Titel :
Conduction and Breakdown in Solid Dielectrics, 1989., Proceedings of the 3rd International Conference on
Conference_Location :
Trondheim
DOI :
10.1109/ICSD.1989.69238
