DocumentCode :
1664461
Title :
A ±0.4°C (3σ) −70 to 200°C time-domain temperature sensor based on heat diffusion in Si and SiO2
Author :
Van Vroonhoven, Caspar ; D´Aquino, Dan ; Makinwa, Kofi
Author_Institution :
Delft Univ. of Technol., Delft, Netherlands
fYear :
2012
Firstpage :
204
Lastpage :
206
Abstract :
Despite the increasing use of ICs at very high temperatures (>;150°C) in automotive and industrial applications, sensing such temperatures is still mostly done with discrete thermocouples or thermistors. This is because conventional integrated temperature sensors are based on BJTs, which have a strongly process-, stress- and temperature-dependent saturation current (Is). Together with other leakage currents, this leads to rapidly increasing temperature errors at high temperatures: up to ±3.0°C at 200°C [1].
Keywords :
leakage currents; temperature sensors; thermistors; thermocouples; IC; SiO2; automotive application; discrete thermocouples; heat diffusion; industrial application; leakage currents; process-dependent saturation current; stress-dependent saturation current; temperature 200 C; temperature-dependent saturation current; thermistors; time-domain temperature sensor; Heating; Silicon; Temperature distribution; Temperature measurement; Temperature sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference Digest of Technical Papers (ISSCC), 2012 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0193-6530
Print_ISBN :
978-1-4673-0376-7
Type :
conf
DOI :
10.1109/ISSCC.2012.6176976
Filename :
6176976
Link To Document :
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