Thin film deposition of BST by pulsed ion beam evaporation

Author

Yatsui, K. ; Ohtomo, Kuni ; Jiang, Wei

Author_Institution

Extreme Energy Density Res. Inst., Nagaoka Univ. of Technol., Niigata, Japan

Volume

1

fYear

1999

Firstpage

157

Abstract

Ablation plasma generated by an intense, pulsed ion beam was used for thin-film deposition of commercially interesting materials such as (Ba/sub x/, Sr/sub 1-x/)TiO/sub 3/. The deposition has been carried out in vacuum and with the substrate at room temperature. The deposited thin films were analyzed by using RES, AFM, SEM and XRD. The analytical results have shown that this deposition technique is applicable to many kinds of materials with very high deposition rate and low cost.

Keywords

barium compounds; ion beam assisted deposition; plasma deposition; strontium compounds; thin films; titanium compounds; vacuum deposited coatings; vacuum deposition; AFM; Ba/sub x/Sr/sub 1-x/TiO/sub 3/ thin film deposition; BaSrTiO/sub 3/; RES; SEM; XRD; ablation plasma; deposition rate; deposition technique; intense pulsed ion beam; pulsed ion beam evaporation; substrate; vacuum deposition; Binary search trees; Ion beams; Plasma applications; Plasma materials processing; Plasma temperature; Pulse generation; Sputtering; Strontium; Substrates; X-ray scattering;

fLanguage

English

Publisher

ieee

Conference_Titel

Pulsed Power Conference, 1999. Digest of Technical Papers. 12th IEEE International

Conference_Location

Monterey, CA, USA

Print_ISBN

0-7803-5498-2

Type

conf

DOI

10.1109/PPC.1999.825436

Filename

825436