Title :
Thin film deposition of BST by pulsed ion beam evaporation
Author :
Yatsui, K. ; Ohtomo, Kuni ; Jiang, Wei
Author_Institution :
Extreme Energy Density Res. Inst., Nagaoka Univ. of Technol., Niigata, Japan
Abstract :
Ablation plasma generated by an intense, pulsed ion beam was used for thin-film deposition of commercially interesting materials such as (Ba/sub x/, Sr/sub 1-x/)TiO/sub 3/. The deposition has been carried out in vacuum and with the substrate at room temperature. The deposited thin films were analyzed by using RES, AFM, SEM and XRD. The analytical results have shown that this deposition technique is applicable to many kinds of materials with very high deposition rate and low cost.
Keywords :
barium compounds; ion beam assisted deposition; plasma deposition; strontium compounds; thin films; titanium compounds; vacuum deposited coatings; vacuum deposition; AFM; Ba/sub x/Sr/sub 1-x/TiO/sub 3/ thin film deposition; BaSrTiO/sub 3/; RES; SEM; XRD; ablation plasma; deposition rate; deposition technique; intense pulsed ion beam; pulsed ion beam evaporation; substrate; vacuum deposition; Binary search trees; Ion beams; Plasma applications; Plasma materials processing; Plasma temperature; Pulse generation; Sputtering; Strontium; Substrates; X-ray scattering;
Conference_Titel :
Pulsed Power Conference, 1999. Digest of Technical Papers. 12th IEEE International
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5498-2
DOI :
10.1109/PPC.1999.825436
