Title :
An extreme ultraviolet radiation source based on a gas discharge plasma
Author :
Bergmann, K. ; Schriever, G. ; Rosier, O. ; Muller, M. ; Reichartz, D. ; Neff, W. ; Lebert, R.
Author_Institution :
Lehrstuhl fur Lasertech., Tech. Hochschule Aachen, Germany
Abstract :
An extreme ultraviolet radiation source that emits in the spectral range around 13 nm wavelength or 100 eV photon energy is discussed. The source is based on a small pinch plasma which is generated in a fast discharge of electrically stored energy in the range of 1 Joule. Theoretical considerations are presented which show that this energy is close to the minimal required energy for a dynamic pinch plasma which effectively emits radiation in the spectral range of interest. Here, the constraints given by the gas discharge apparatus have to be taken into account. These constraints refer to, e.g., the length of the plasma column or the achievable compression or number density.
Keywords :
discharges (electric); light sources; pinch effect; plasma applications; pulse generators; pulsed power technology; 1 J; 100 EeV; 13 mm; compression; dynamic pinch plasma; electrically stored energy; extreme ultraviolet radiation source; fast discharge; gas discharge apparatus; gas discharge plasma; number density; photon energy; plasma column length; pulsed power; radiation emission; small pinch plasma; Discharges; Electrodes; Fault location; Gas lasers; Lithography; Plasma density; Plasma sources; Plasma temperature; Plasma waves; Ultraviolet sources;
Conference_Titel :
Pulsed Power Conference, 1999. Digest of Technical Papers. 12th IEEE International
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5498-2
DOI :
10.1109/PPC.1999.825466