DocumentCode
1665859
Title
Observation of new quantum interference effect in solids
Author
Tavkhelidze, Avto ; Bibilashvili, Amiran ; Jangidze, Larissa ; Katan, Nechama ; Shimkunas, Alex ; Mauger, Philip ; Rempfer, Gertrude F. ; Almaraz, Luis ; Dixon, Todd ; Kordesch, Martin E.
Author_Institution
Tbilisi State Univ., Georgia
fYear
2005
Firstpage
11
Lastpage
12
Abstract
The experiments and theoretical basis for reducing the work function of Au and SiO2 thin films are discussed. In order to achieve the quantum interference of free electrons, the geometry of the solid is modified so that the de Broglie waves interfere destructively inside the solid. If a metal surface is modified with patterned indents, the Fermi energy increases and consequently the electron work function decreases. This effect is named the Avto effect. Work function reductions of 0.5 eV and 0.2 eV are observed in Au and SiO2 films, respectively. Comparative measurements of work function are made using the Kelvin probe method based on the compensation of internal contact potential difference. Electron emission from the same thin films are also studied using photoelectron emission microscopy.
Keywords
Fermi level; contact potential; electron emission; gold; metallic thin films; silicon compounds; wave mechanics; work function; Au; Kelvin probe method; SiO2; de Broglie waves; internal contact potential difference; photoelectron emission microscopy; quantum interference effect; thin films; work function reduction; Electron emission; Electron microscopy; Geometry; Gold; Interference; Kelvin; Photoelectron microscopy; Probes; Solids; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN
0-7803-8397-4
Type
conf
DOI
10.1109/IVNC.2005.1619459
Filename
1619459
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