DocumentCode :
1666036
Title :
Optimization of periodic nanopore surface texturing for silicon thin film photovoltaic application
Author :
Wang, Fei ; Li, Junshuai ; Yu, Hongyu
Author_Institution :
Sch. of EEE, Nayang Technol. Univ., Singapore, Singapore
fYear :
2010
Firstpage :
1351
Lastpage :
1352
Abstract :
In this paper, nanopore texturing surface is systematically investigated and optimized via simulation for silicon thin film photovoltaic application, where the optical characteristics are closely correlated with the nanopore structural parameters. The result provides an additional design guideline of nanostructure surface texturing for photovoltaic applications.
Keywords :
elemental semiconductors; nanofabrication; nanoporous materials; photovoltaic cells; reflectivity; semiconductor thin films; silicon; surface texture; Si; nanopore structural parameters; optical characteristics; optimisation; periodic nanopore surface texturing; thin film photovoltaic application; Absorption; Nanoporous materials; Optical arrays; Optical films; Photovoltaic systems; Refractive index; Semiconductor thin films; Silicon; Solar power generation; Surface texture;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
Type :
conf
DOI :
10.1109/INEC.2010.5424863
Filename :
5424863
Link To Document :
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