• DocumentCode
    1666041
  • Title

    Linear model application for the design of transparent conductive In2O3 electrodes

  • Author

    Axelevitch, A. ; Gross, D. ; Rabinovitch, E. ; Golan, G.

  • Author_Institution
    Open Univ. of Israel, Tel Aviv, Israel
  • fYear
    1996
  • Firstpage
    274
  • Lastpage
    277
  • Abstract
    Transparent conductive coatings with high electrical conductivity and maximum optical transparency attracts much attention in recent years. Most of the works published till present in this field were concentrated in the physical analysis and design of thin film coatings. In this paper we present a different approach to the fabrication design of transparent conductive thin films. Instead of analyzing complex physical models of the final product, a mathematical linear model to control the processing stages of these films production is presented. This linear model is based on a mathematical approach which optimize the processing procedure parameters to yield the best coating performance. The main idea in this linear model optimization procedure lies in finding functions extremums using their derivatives and gradients. The Transparent Conductive Oxide (TCO) Indium Oxide thin films (In2 O3) were obtained by DC magnetron sputtering from pure Indium Oxide target in an argon atmosphere. The obtained transparent conducting thin films had the following parameters: -Transparency in 550 nm wavelength-90.7% (including the glass substrate with an absolute transparency of 91.08%); -resistivity of 0.043 Ω·cm for a 2525 Å film. As a result of this work the linear model was found to be a useful instrument for the general fabrication design of thin film systems
  • Keywords
    optimisation; DC magnetron sputtering; In2O3; electrical conductivity; fabrication design; linear model; mathematical optimization; optical transparency; thin film coating; transparent conductive oxide electrode; Atmospheric modeling; Coatings; Conductive films; Conductivity; Indium; Mathematical model; Optical device fabrication; Optical films; Process control; Sputtering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical and Electronics Engineers in Israel, 1996., Nineteenth Convention of
  • Conference_Location
    Jerusalem
  • Print_ISBN
    0-7803-3330-6
  • Type

    conf

  • DOI
    10.1109/EEIS.1996.566948
  • Filename
    566948