DocumentCode
1666438
Title
Overview of nanofabrication technologies for field emission devices
Author
Cui, Zheng
Author_Institution
Rutherford Appleton Lab., Chilton, UK
fYear
2005
Firstpage
46
Lastpage
47
Abstract
Fabrication of various field emitter devices (FED) have been possible through recent advances in nanofabrication technologies. The technologies to pattern nanometer scale structures developed by other industries and their applications, was presented in this paper. The great potentials of these nanofabrication technologies should be explored for the benefit of FED development.
Keywords
field emission; nanopatterning; nanostructured materials; field emission devices; nanofabrication technologies; nanometer scale structures; nanopatterning; overview; Electron optics; Electronics industry; Flat panel displays; Geometry; Integrated circuit technology; Laboratories; Lithography; Nanofabrication; Optical films; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN
0-7803-8397-4
Type
conf
DOI
10.1109/IVNC.2005.1619477
Filename
1619477
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