Title :
Demonstration of Super-collimation in SOI photonic crystal fabricated by 0.13µm CMOS technology
Author :
Wu, Aimin ; Yang, Zhifeng ; Lin, Xulin ; Jiang, Xunya ; Gan, Fuwan ; Zhang, Miao ; Wang, Xi ; Zou, Shichang
Author_Institution :
Shanghai Inst. of Microsyst. & Inf. Technol., State Key Lab. of Functional Mater. for Inf., Chinese Acad. of Sci., Shanghai, China
Abstract :
Near-perfect photonic crystal structure on 8´ SOI wafer was fabricated through standard 0.13μm CMOS technology. Large scale super-collimation was demonstrated in the photonic crystal region which is coinciding with simulation result. The result represents a promising prospect of super-collimation waveguide on macroscopic optical connection.
Keywords :
CMOS integrated circuits; integrated optics; nanophotonics; optical collimators; optical dispersion; optical interconnections; optical waveguides; photonic crystals; silicon-on-insulator; CMOS technology; SOI photonic crystal; onchip optical connection; size 0.13 μm; supercollimating waveguide; supercollimation;
Conference_Titel :
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-3543-2
Electronic_ISBN :
978-1-4244-3544-9
DOI :
10.1109/INEC.2010.5424880
