• DocumentCode
    1666507
  • Title

    Metal-based photonic coatings from electrochemical methods

  • Author

    Tsang, Chun Kwan ; Xu, Zhengtao ; Li, Yang Yang

  • Author_Institution
    Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon, China
  • fYear
    2010
  • Firstpage
    1321
  • Lastpage
    1322
  • Abstract
    Plasmonic materials offer the remarkable ability to manipulate light by metal-dielectric features significantly smaller than the wavelengths of free space photons. The fabrication of such miniscule features for the desired plasmonic properties, however, remains challenging. Here we report an economical and versatile bottom-up approach that combines electrodeposition and dealloying techniques for fabricating elaborate metal-based structures, achieving structural resolutions comparable to current lithography techniques. We present our studies on the metal-based counterpart of the rugate filter. These metal-based photonic films are porous, magnetic, and feature strong optical responses in visible wavelengths, while their structural periodicities are an order of magnitude smaller than the light´s free space wavelength.
  • Keywords
    antireflection coatings; electrodeposition; lithography; plasmonics; dealloying techniques; electrochemical methods; electrodeposition techniques; free space photons; lithography techniques; metal-based photonic coatings; metal-based photonic films; metal-dielectric features; plasmonic materials; rugate filter; Coatings; Conductive films; Inorganic materials; Magnetic films; Magnetic materials; Optical films; Optical filters; Optical sensors; Plasmons; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2010 3rd International
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-3543-2
  • Electronic_ISBN
    978-1-4244-3544-9
  • Type

    conf

  • DOI
    10.1109/INEC.2010.5424881
  • Filename
    5424881