DocumentCode
1666507
Title
Metal-based photonic coatings from electrochemical methods
Author
Tsang, Chun Kwan ; Xu, Zhengtao ; Li, Yang Yang
Author_Institution
Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon, China
fYear
2010
Firstpage
1321
Lastpage
1322
Abstract
Plasmonic materials offer the remarkable ability to manipulate light by metal-dielectric features significantly smaller than the wavelengths of free space photons. The fabrication of such miniscule features for the desired plasmonic properties, however, remains challenging. Here we report an economical and versatile bottom-up approach that combines electrodeposition and dealloying techniques for fabricating elaborate metal-based structures, achieving structural resolutions comparable to current lithography techniques. We present our studies on the metal-based counterpart of the rugate filter. These metal-based photonic films are porous, magnetic, and feature strong optical responses in visible wavelengths, while their structural periodicities are an order of magnitude smaller than the light´s free space wavelength.
Keywords
antireflection coatings; electrodeposition; lithography; plasmonics; dealloying techniques; electrochemical methods; electrodeposition techniques; free space photons; lithography techniques; metal-based photonic coatings; metal-based photonic films; metal-dielectric features; plasmonic materials; rugate filter; Coatings; Conductive films; Inorganic materials; Magnetic films; Magnetic materials; Optical films; Optical filters; Optical sensors; Plasmons; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location
Hong Kong
Print_ISBN
978-1-4244-3543-2
Electronic_ISBN
978-1-4244-3544-9
Type
conf
DOI
10.1109/INEC.2010.5424881
Filename
5424881
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