Title :
Field electron emission from carbon nanotubes coated on TiSi2 buffer layer
Author :
Gu, C.Z. ; Yue, S.L. ; Li, J.J. ; Golberg, D. ; Tang, C.C. ; Bando, Y.
Author_Institution :
Int. Center for Young Sci., Nat. Inst. for Mater. Sci., Tsukuba, Japan
Abstract :
Carbon nanotubes (CNTs) are grown with a catalysts of NiB/Al2O3 using a tube furnace. A 30 nm-thick TiSi2 layer is grown on a mirror-polished n-type Si(001) wafer in the DC magnetron sputtering chamber. CNTs are dispersed into ZEP 150 photoresist mixed with hexamethyldisilizane (HMDS) and coated on different substrates by spin coating method. CNTs density of 108 cm-2 are obtained on the surface of various substrates. Field emission experiments are performed at a pressure of 10-8 Torr at 100 μm distance between the substrate and a movable anode probe. The measured emission area is about 1 mm2. Emission characteristics are discussed and explained with the inter field emission model.
Keywords :
alumina; buffer layers; carbon nanotubes; catalysts; electron field emission; nickel compounds; photoresists; spin coating; sputter deposition; titanium compounds; 10E-8 torr; C; CNT density; DC magnetron sputtering; NiB-Al2O3; Si; TiSi2; ZEP 150 photoresist; buffer layer; carbon nanotubes; catalysts; disperse nanotubes; emission area; emission characteristics; field electron emission; hexamethyldisilizane; inter field emission model; mirror-polished Si(001) wafer; movable anode probe; n-type Si(001) wafer; spin coating; substrate; tube furnace; Anodes; Area measurement; Carbon nanotubes; Coatings; Electron emission; Furnaces; Magnetic field measurement; Probes; Resists; Sputtering;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN :
0-7803-8397-4
DOI :
10.1109/IVNC.2005.1619484
