• DocumentCode
    1667940
  • Title

    Obvious suppression of performance degradation induced by thermal effect in SOI power LDMOSFETs using accumulation mode device structure

  • Author

    Cheng, Weitao ; Teramoto, Akinobu ; Ohmi, Tadahiro

  • Author_Institution
    Tohoku Univ., Sendai, Japan
  • fYear
    2009
  • Firstpage
    1
  • Lastpage
    8
  • Abstract
    In this paper, we demonstrate that the advantages of obvious improvement o f the mobility and current drivability at high temperatures and the greatly suppressed self-heating effects in accumulation mode SOI power LDMOSFETs. We reveal the mechanisms of these advantages are resulted from the bulk current and accumulation mode device structure and propose that the accumulation mode device structure is very useful to realize high performance SOI power LDMOSFETs.
  • Keywords
    MOSFET; silicon-on-insulator; LDMOSFETs; Si; accumulation mode device structure; bulk current; self-heating; silicon-on-insulator; Cleaning; Large scale integration; MOSFET circuits; Microwave devices; Oxidation; Plasma density; Plasma devices; Plasma temperature; Silicon on insulator technology; Thermal degradation; Accumulation mode; High temperature; LDMOSFET; Self-heating; bulk current; silicon-on-insulator;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Electronics and Applications, 2009. EPE '09. 13th European Conference on
  • Conference_Location
    Barcelona
  • Print_ISBN
    978-1-4244-4432-8
  • Electronic_ISBN
    978-90-75815-13-9
  • Type

    conf

  • Filename
    5279027