DocumentCode
1667940
Title
Obvious suppression of performance degradation induced by thermal effect in SOI power LDMOSFETs using accumulation mode device structure
Author
Cheng, Weitao ; Teramoto, Akinobu ; Ohmi, Tadahiro
Author_Institution
Tohoku Univ., Sendai, Japan
fYear
2009
Firstpage
1
Lastpage
8
Abstract
In this paper, we demonstrate that the advantages of obvious improvement o f the mobility and current drivability at high temperatures and the greatly suppressed self-heating effects in accumulation mode SOI power LDMOSFETs. We reveal the mechanisms of these advantages are resulted from the bulk current and accumulation mode device structure and propose that the accumulation mode device structure is very useful to realize high performance SOI power LDMOSFETs.
Keywords
MOSFET; silicon-on-insulator; LDMOSFETs; Si; accumulation mode device structure; bulk current; self-heating; silicon-on-insulator; Cleaning; Large scale integration; MOSFET circuits; Microwave devices; Oxidation; Plasma density; Plasma devices; Plasma temperature; Silicon on insulator technology; Thermal degradation; Accumulation mode; High temperature; LDMOSFET; Self-heating; bulk current; silicon-on-insulator;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Electronics and Applications, 2009. EPE '09. 13th European Conference on
Conference_Location
Barcelona
Print_ISBN
978-1-4244-4432-8
Electronic_ISBN
978-90-75815-13-9
Type
conf
Filename
5279027
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