Title :
Numerical simulation of the I-V characteristics of heterojunctions including thermionic emission mechanism
Author :
Debbar, Nacer ; Az-Mashary, B.
Author_Institution :
Dept. of Electr. Eng., King Saud Univ., Riyadh, Saudi Arabia
fDate :
6/20/1905 12:00:00 AM
Abstract :
The effects of temperature, Al mole fraction, and doping on the I-V characteristics of abrupt GaAs/AlGaAs heterojunctions are studied by numerically solving the basic semiconductor equations. Numerical models based on drift-diffusion with and without inclusion of thermionic emission current at the heterointerface are used and their results are compared. The simulation shows that neglecting the thermionic emission will overestimate the current, especially, at lower temperatures, at higher mole fraction, or for n-N structures. Under high injection, as temperature increases, current becomes limited mainly by the series resistance. The asymmetry of doping level its found to affect significantly the transport process at lower temperatures only
Keywords :
Fermi level; III-V semiconductors; Poisson equation; aluminium compounds; carrier lifetime; carrier mobility; electron-hole recombination; energy gap; gallium arsenide; heterojunction bipolar transistors; semiconductor device models; semiconductor heterojunctions; thermionic emission; Al mole fraction effects; GaAs-AlGaAs; I-V characteristics; Newton method; Poisson equation; Shockley-Read-Hall statistics; abrupt heterojunctions; bandgap energy; carrier mobility; conduction band diagram; doping effects; doping level asymmetry; drift-diffusion models; high injection; numerical simulation; quasi-Fermi level; series resistance; temperature effects; thermionic emission mechanism; Charge carrier processes; Conducting materials; Doping; Equations; Gallium arsenide; Heterojunctions; Numerical simulation; Photonic band gap; Temperature; Thermionic emission;
Conference_Titel :
Microelectronics, 1998. ICM '98. Proceedings of the Tenth International Conference on
Conference_Location :
Monastir
Print_ISBN :
0-7803-4969-5
DOI :
10.1109/ICM.1998.825584