DocumentCode :
1668350
Title :
The electron field emission properties of Ag-SiO2 nanocomposite layers
Author :
Tsang, W.M. ; Stolojan, V. ; Giusca, C. ; Poa, C.H.P. ; Sealy, B. ; Silva, S.R.P. ; Wong, S.P.
Author_Institution :
Adv. Technol. Inst., Surrey Univ., Guildford, UK
fYear :
2005
Firstpage :
206
Lastpage :
207
Abstract :
This paper investigates the introduction of nano-sized Ag cluster into a SiO2 matrix by Ag+ implantation on thermally oxidised SiO2 layers. The embedded Ag nanoclusters create conducting paths for the emissive electrons from substrate to emission surface and give rise to a local electric field enhancement due to an electrical inhomogeneity effect.
Keywords :
electron field emission; ion implantation; nanocomposites; silicon compounds; silver; Ag-SiO2; conducting paths; electrical inhomogeneity; electron field emission; implantation; local electric field enhancement; nanocomposite layers; Atomic force microscopy; Atomic layer deposition; Backscatter; Electron emission; Iron; Nonuniform electric fields; Spectroscopy; X-ray diffraction; Yagi-Uda antennas;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN :
0-7803-8397-4
Type :
conf
DOI :
10.1109/IVNC.2005.1619558
Filename :
1619558
Link To Document :
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