• DocumentCode
    1668350
  • Title

    The electron field emission properties of Ag-SiO2 nanocomposite layers

  • Author

    Tsang, W.M. ; Stolojan, V. ; Giusca, C. ; Poa, C.H.P. ; Sealy, B. ; Silva, S.R.P. ; Wong, S.P.

  • Author_Institution
    Adv. Technol. Inst., Surrey Univ., Guildford, UK
  • fYear
    2005
  • Firstpage
    206
  • Lastpage
    207
  • Abstract
    This paper investigates the introduction of nano-sized Ag cluster into a SiO2 matrix by Ag+ implantation on thermally oxidised SiO2 layers. The embedded Ag nanoclusters create conducting paths for the emissive electrons from substrate to emission surface and give rise to a local electric field enhancement due to an electrical inhomogeneity effect.
  • Keywords
    electron field emission; ion implantation; nanocomposites; silicon compounds; silver; Ag-SiO2; conducting paths; electrical inhomogeneity; electron field emission; implantation; local electric field enhancement; nanocomposite layers; Atomic force microscopy; Atomic layer deposition; Backscatter; Electron emission; Iron; Nonuniform electric fields; Spectroscopy; X-ray diffraction; Yagi-Uda antennas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
  • Print_ISBN
    0-7803-8397-4
  • Type

    conf

  • DOI
    10.1109/IVNC.2005.1619558
  • Filename
    1619558
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1668350