DocumentCode
1668437
Title
The effects of high work function electrodes on the electrical properties of solution processed ZnO thin film transistor
Author
Chen, Tao ; Liu, Shu-Yi ; Deng, Shao-Ren ; Li, Bing-Zong ; Qu, Xin-Ping
Author_Institution
Dept. of Microelectron., Fudan Univ., Shanghai, China
fYear
2010
Firstpage
1191
Lastpage
1192
Abstract
In this work, the effects of electrodes on the performance of sol-gel fabricated ZnO thin film transistor were investigated. The metal with high work function such as Pt was employed as the source-drain electrodes. Compared to the device with Al electrodes as reported before, the transistor fabricated with Pt electrode exhibited lower saturation voltage and current, which was due to the Schottky contact between the Pt electrode and the ZnO film. The result has also been proved by the current-voltage (IV) measurement of the Pt-ZnO-Pt structure. For the Schottky contact between the electrodes and the channel layer, the current saturated when the source was depleted. This kind of device reduced the operation voltage and power dissipations effectively.
Keywords
II-VI semiconductors; Schottky barriers; electrodes; metal-semiconductor-metal structures; platinum; semiconductor thin films; thin film transistors; wide band gap semiconductors; work function; zinc compounds; Pt-ZnO-Pt; Schottky contact; channel layer; current-voltage measurement; operation voltage; power dissipations; saturation voltage; sol-gel process; source-drain electrodes; thin film transistor; work function; Coatings; Electrodes; Ion beams; Ohmic contacts; Pulsed laser deposition; Schottky barriers; Sputtering; Thin film transistors; Voltage; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location
Hong Kong
Print_ISBN
978-1-4244-3543-2
Electronic_ISBN
978-1-4244-3544-9
Type
conf
DOI
10.1109/INEC.2010.5424958
Filename
5424958
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