DocumentCode
1668567
Title
High aspect ratio Pt field emitters fabricated by electron beam assisted deposition
Author
Jin, A.Z. ; Wang, Z.L. ; Li, H.J. ; Luo, Q. ; Yang, H.F. ; Cui, Z. ; Gu, C.Z.
Author_Institution
Beijing Nat. Lab. for Condensed Matter Phys., Chinese Acad. of Sci., Beijing, China
fYear
2005
Abstract
In this work, we studied the fabrication of high aspect ratio individual Pt nanopillar as field emitters and measured their field emission properties. Pt nanopillars were fabricated by electron beams (EB) assisted chemical vapor deposition (CVD) method with a dual-beam focused ion beam (FDB) system.
Keywords
chemical vapour deposition; electron beam deposition; field emitter arrays; focused ion beam technology; nanostructured materials; platinum; Pt; chemical vapor deposition; dual-beam focused ion beam system; electron beam assisted deposition; high aspect ratio field emitters; nanopillar; Anodes; Chemical vapor deposition; Current measurement; Electron beams; Electron emission; Fabrication; Laboratories; Physics; Probes; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN
0-7803-8397-4
Type
conf
DOI
10.1109/IVNC.2005.1619569
Filename
1619569
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