Title :
Nanofabrication of templates with ultra sharp SiC tips for nanoimprint lithography
Author :
Chen, Yifang ; Tao, Jiarui ; Malik, Adnan ; Zhao, Xingzhong ; Zheng Cui ; Huq, Ejaz
Author_Institution :
Rutherford Appleton Lab., Chilton, UK
Abstract :
Development of a novel nanofabrication process is reported for the fabrication of SiC nanoimprint templates with ultra sharp tip arrays. The process involves electron beam lithography (EBL) to pattern dot arrays, reactive ion etch (RIE) to form tip shape, oxidation/wet etch to sharpen the tips and finally silicon tips conversion into SiC to harden the tips. The resulting SiC tips are not only of high resolution for nanoimprint lithography, but also of high hardness for high pressure lithography process. Sharp tips are as small as a few nanometers. With such templates, manufacture of vacuum nano-electronic devices and large area nano-electronics can be carried out by nanoimprint lithography.
Keywords :
electron beam lithography; hardness; nanoelectronics; nanolithography; oxidation; silicon; silicon compounds; soft lithography; sputter etching; surface hardening; vacuum microelectronics; SiC; dot arrays patterning; electron beam lithography; hardness; high pressure lithography process; high resolution tips; large area nanoelectronics; nanofabrication; nanoimprint lithography; nanoimprint templates; oxidation/wet etch; reactive ion etch; silicon tips conversion; tip shape; tip sharpening; tips hardening; ultra sharp tip arrays; vacuum nanoelectronic devices; Electron beams; Fabrication; Lithography; Nanofabrication; Nanolithography; Nanoscale devices; Oxidation; Shape; Silicon carbide; Wet etching;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN :
0-7803-8397-4
DOI :
10.1109/IVNC.2005.1619575
