DocumentCode :
1668809
Title :
Development of a low emittance electron gun based on field emission cathodes
Author :
Ganter, R. ; Bakker, R.J. ; Betemps, R. ; Dehler, M. ; Gerber, T. ; Gobrecht, J. ; Gough, C. ; Johnson, M. ; Kirk, E. ; Knopp, G. ; Le Pimpec, F. ; Li, K. ; Paraliev, M. ; Pedrozzi, M. ; Rivkin, L. ; Sehr, H. ; Schulz, L. ; Wrulich, A.
Author_Institution :
Paul Scherrer Inst., Villigen, Switzerland
fYear :
2005
Firstpage :
244
Lastpage :
245
Abstract :
Field emitters are investigated for use as a low emittance electron gun. Two available field emitter technologies are currently explored; the field emitter arrays (FEAs) with individual focusing and single tip cathode with robust and fairly blunt apex. The challenge is to achieve several amperes of peak current without tip destructions. Very good cathode and environmental conditioning procedures with extremely short emission duration (ns) at low repetition rate (10 Hz) gave encouraging results to reach high peak current emission. For a free electron laser application, very short emission durations are preferred. Such operation regime should prevent the tip from overheating so that higher current densities could be reached. Another possible low emittance electron sources are single needle tips made from etched wires and which can be coated and formed in order to carry high current emission. One way to achieve short emission duration is to use pulsed laser light illuminating the tip while high electric field is applied.
Keywords :
cathodes; current density; electron guns; field emitter arrays; free electron lasers; 10 Hz; apex; current densities; emission duration; etched wires; field emission cathodes; field emitter arrays; focusing; free electron laser application; low emittance electron gun; overheating; peak current emission; pulsed laser light; repetition rate; single needle tips; single tip cathode; tip destructions; Cathodes; Current density; Electron emission; Electron sources; Etching; Field emitter arrays; Free electron lasers; Laser applications; Needles; Robustness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
Print_ISBN :
0-7803-8397-4
Type :
conf
DOI :
10.1109/IVNC.2005.1619577
Filename :
1619577
Link To Document :
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