DocumentCode
1670128
Title
Double-gate SOI MOSFETs with asymmetrical configuration
Author
Allibert, F. ; Zaslavsky, A. ; Cristoloveanu, S.
Author_Institution
Lab. de Phys. des Composants a Semicond., ENSERG, Grenoble, France
fYear
2001
Firstpage
149
Lastpage
150
Abstract
In this paper, we investigate additional features of performance (parasitic capacitances, switching capability etc.) and applications of slightly asymmetric DG-MOSFETs. Our simulations indicate no major disadvantages to asymmetric 50/100nm DG.
Keywords
MOSFET; capacitance; semiconductor device models; silicon-on-insulator; 100 nm; 50 nm; Si-SiO/sub 2/; asymmetrical configuration; double-gate; double-gate SOI MOSFETs; parasitic capacitances; performance; simulations; slightly asymmetric DG-MOSFETs; switching capability; Doping; Fabrication; Land mobile radio; Logic devices; Logic testing; MOSFETs; Microelectronics; Parasitic capacitance; Transconductance; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 2001 IEEE International
Conference_Location
Durango, CO, USA
ISSN
1078-621X
Print_ISBN
0-7803-6739-1
Type
conf
DOI
10.1109/SOIC.2001.958030
Filename
958030
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