DocumentCode :
1670286
Title :
A SOI capacitor-less 1T-DRAM concept
Author :
Okhonin, S. ; Nagoga, M. ; Sallese, J.M. ; Fazan, P.
Author_Institution :
LEG, Swiss Fed. Inst. of Technol., Lausanne, Switzerland
fYear :
2001
Firstpage :
153
Lastpage :
154
Abstract :
A simple 1T DRAM cell concept is proposed for the first time. It exploits the body charging of PD SOI devices to store the information. This cell is at least two times smaller in area than the conventional 1T/1C DRAM cell and does not require the integration of a storage capacitor. This concept should allow the manufacture of low cost DRAMs and eDRAMs for 100 and sub 100 nm generations.
Keywords :
DRAM chips; elemental semiconductors; integrated circuit design; nanotechnology; silicon; silicon-on-insulator; 1 Tbit; 100 nm; PD SOI; SOI capacitor-less 1T-DRAM; Si-SiO/sub 2/; body charging; eDRAMs; low cost DRAMs; manufacture; Analytical models; Bipolar transistors; CMOS technology; Capacitors; Impact ionization; Leg; MOSFET circuits; Manufacturing; Random access memory; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 2001 IEEE International
Conference_Location :
Durango, CO, USA
ISSN :
1078-621X
Print_ISBN :
0-7803-6739-1
Type :
conf
DOI :
10.1109/SOIC.2001.958032
Filename :
958032
Link To Document :
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