• DocumentCode
    1670455
  • Title

    The influence of the micro-structure on optical properties of nc-Si:H films for solar cells

  • Author

    Gao, Xiao-Ni ; Ding, Jian-Ning ; Yuan, Ning-Yi ; Guang Gui ; Guo, Li-Qiang

  • Author_Institution
    Center of Micro/Nano Sci. & Technol., Jiangsu Univ., Zhenjiang, China
  • fYear
    2010
  • Firstpage
    1068
  • Lastpage
    1069
  • Abstract
    The intrinsic hydrogenated nano-crystalline silicon (nc-Si:H) films for p-i-n tandem solar cells have been deposited on the corning 7059 glass substrates by plasma enhanced chemical vapor deposition (PECVD) assisted with direct current bias, and were characterized by Raman and ultraviolet-visible (UV-VIS) transmission spectra. By working on varying hydrogen dilution of Silane (ß) and direct current bias (VDC) separately, the dependence of the optical properties of nc-Si:H films on the micro-structure properties has been discussed. Results have shown: Well fabricated structure of the films result in a small optical band-gap (Eg). However, when amorphous content, namely lattice disorder, increases, Eg is big. Of micro-structure´s parameters, the decrease of crystal volume (XC), responsible for nano-structure, is the main cause for blue shift of Raman peak position and the decrease in the Raman intensity. And qualitative and quantitative analysis has carried out to get that XC influenced Eg more severely than crystalline size by varying ß and VDC. With XC varied, Eg showed a contrary change trend correspondingly.
  • Keywords
    Raman spectra; crystal microstructure; nanostructured materials; optical properties; plasma CVD; silicon; solar cells; ultraviolet spectra; visible spectra; Raman transmission spectra; Si:H; corning 7059 glass substrates; direct current bias; intrinsic hydrogenated nanocrystalline silicon; lattice disorder; microstructure; optical band gap; optical properties; p-i-n tandem solar cells; plasma enhanced chemical vapor deposition; qualitative analysis; quantitative analysis; silane; ultraviolet-visible transmission spectra; Chemical vapor deposition; Glass; Hydrogen; Optical films; PIN photodiodes; Photovoltaic cells; Plasma chemistry; Plasma properties; Semiconductor films; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2010 3rd International
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-3543-2
  • Electronic_ISBN
    978-1-4244-3544-9
  • Type

    conf

  • DOI
    10.1109/INEC.2010.5425029
  • Filename
    5425029