A miniaturized Orbitron pump for MEMS applications

Author

Koops, Hans W P

Author_Institution

NaWoTec GmbH, Rossdorf, Germany

fYear

2005

Firstpage

364

Lastpage

365

Abstract

The principle of the Orbitron pump is described. Its miniaturization is simulated. Field emitters operating in mbar vacuum levels, with short emitter-extractor distance and an incorporated ion mirror are advantageous compared to heated electron emitters. This miniaturized electron gun requires 16 nA of current but can be supplied with up to 400 μA of ionizing current. Employing micromechanical technologies, the Orbitron pump can be built and integrated into a MEMS device to supply UHV in a volume of <1 Mio μm³ on a chip. Connecting the pump with a load vacuum volume, miniature UHV requiring devices can be pumped down on chip and operated by only electrical controls.

Keywords

electron beam deposition; electron guns; field emitter arrays; ionisation; micromechanical devices; vacuum pumps; 16 nA; 400 muA; MEMS; UHV; field emitters; heated electron emitters; ionizing current; miniaturization; miniaturized Orbitron pump; miniaturized electron gun; short emitter-extractor distance; Anodes; Cathodes; Electron beams; Electron guns; Gettering; Heat pumps; Joining processes; Microelectromechanical devices; Micromechanical devices; Titanium; Electron beam induced deposition; Field emitter; Gas ionization; Getter pump; Orbitron pump;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International

Print_ISBN

0-7803-8397-4

Type

conf

DOI

10.1109/IVNC.2005.1619637

Filename

1619637