DocumentCode
1671953
Title
Al-doping in CsLiB6 O10 for high resistance against UV laser-induced damage
Author
Takachiho, K. ; Yoshimura, M. ; Fukushima, Y. ; Lu, Z.M. ; Takahashi, Y. ; Sasaki, T. ; Mori, Y.
Author_Institution
Grad. Sch. of Eng., Osaka Univ., Suita, Japan
fYear
2012
Firstpage
1
Lastpage
2
Abstract
Al-doped CsLiB6O10 crystals were grown by the top-seeded solution growth method in large sizes with good optical quality. We reveal for the first time that these crystals exhibit outstanding UV-induced damage resistant performance.
Keywords
aluminium; caesium compounds; laser beam effects; ultraviolet radiation effects; CsLiB6O10:Al; UV laser-induced damage; high resistance; optical quality; top-seeded solution growth; Crystals; Degradation; Laser beams; Nonlinear optics; Optical distortion; Optical harmonic generation; Optical pulses;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location
San Jose, CA
Print_ISBN
978-1-4673-1839-6
Type
conf
Filename
6326351
Link To Document