• DocumentCode
    1672585
  • Title

    Deep sub-wavelength plasmonic lithography with antisymmetric surface plasmon mode

  • Author

    Zhu, Peng ; Guo, L. Jay

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Univ. of Michigan, Ann Arbor, MI, USA
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We propose a method for deep-subwavelength patterns using antisymmetric surface plasmon mode in metal/dielectric multilayer metamaterials. Interference patterns with feature size of 22nm(~λincident/20) and fabrication of the device are demonstrated.
  • Keywords
    metal-insulator boundaries; metamaterials; photolithography; plasmonics; surface plasmons; antisymmetric surface plasmon mode; deep sub wavelength plasmonic lithography; metal-dielectric multilayer metamaterial; Gratings; Interference; Lithography; Metals; Nonhomogeneous media; Plasmons; Resists;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2012 Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4673-1839-6
  • Type

    conf

  • Filename
    6326377
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1672585