• DocumentCode
    1673943
  • Title

    DLC passivation layers for high voltage silicon devices

  • Author

    Szmidt, Janusz ; Lisik, Z. ; Mitura, S. ; Cieplak, W. ; Langer, M.

  • Author_Institution
    Warsaw Univ. of Technol., Poland
  • Volume
    1
  • fYear
    1998
  • Firstpage
    345
  • Abstract
    Diamond-like carbon (DLC) layers, due to their properties, can act as very attractive material for microelectronics technology. In particular, they can be used to create passivation layers in semiconductor devices. In the contribution the investigations concerning such an application of the DLC layers as the passivation coating for high-voltage junctions in manufacturing of power semiconductor devices are presented. It has been found that at the ambient temperature the layers played the role of passivation layer very efficiently-the blocking capability of the test devices remained high and the dispersion of the breakdown voltages UBR was lower than before the coating process. At higher temperature, however, the unrequired tendency of banding of the I-V curves has been observed Since the properties of DLC layer strongly depend on the technology, the used technology process as well as technology apparatus are described
  • Keywords
    carbon; passivation; power semiconductor devices; semiconductor device breakdown; C; I-V curves; Si; ambient temperature; blocking capability; breakdown voltages; high voltage semiconductor devices; microelectronics technology; passivation layers; power semiconductor devices; Coatings; Diamond-like carbon; Microelectronics; Organic materials; Passivation; Semiconductor device manufacture; Semiconductor devices; Semiconductor materials; Silicon devices; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrotechnical Conference, 1998. MELECON 98., 9th Mediterranean
  • Conference_Location
    Tel-Aviv
  • Print_ISBN
    0-7803-3879-0
  • Type

    conf

  • DOI
    10.1109/MELCON.1998.692420
  • Filename
    692420