DocumentCode
1673943
Title
DLC passivation layers for high voltage silicon devices
Author
Szmidt, Janusz ; Lisik, Z. ; Mitura, S. ; Cieplak, W. ; Langer, M.
Author_Institution
Warsaw Univ. of Technol., Poland
Volume
1
fYear
1998
Firstpage
345
Abstract
Diamond-like carbon (DLC) layers, due to their properties, can act as very attractive material for microelectronics technology. In particular, they can be used to create passivation layers in semiconductor devices. In the contribution the investigations concerning such an application of the DLC layers as the passivation coating for high-voltage junctions in manufacturing of power semiconductor devices are presented. It has been found that at the ambient temperature the layers played the role of passivation layer very efficiently-the blocking capability of the test devices remained high and the dispersion of the breakdown voltages UBR was lower than before the coating process. At higher temperature, however, the unrequired tendency of banding of the I-V curves has been observed Since the properties of DLC layer strongly depend on the technology, the used technology process as well as technology apparatus are described
Keywords
carbon; passivation; power semiconductor devices; semiconductor device breakdown; C; I-V curves; Si; ambient temperature; blocking capability; breakdown voltages; high voltage semiconductor devices; microelectronics technology; passivation layers; power semiconductor devices; Coatings; Diamond-like carbon; Microelectronics; Organic materials; Passivation; Semiconductor device manufacture; Semiconductor devices; Semiconductor materials; Silicon devices; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrotechnical Conference, 1998. MELECON 98., 9th Mediterranean
Conference_Location
Tel-Aviv
Print_ISBN
0-7803-3879-0
Type
conf
DOI
10.1109/MELCON.1998.692420
Filename
692420
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