• DocumentCode
    1675001
  • Title

    Trade-offs between SiGe and GaAs bipolar ICs

  • Author

    Ning, Tak H.

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    1995
  • Firstpage
    434
  • Lastpage
    438
  • Abstract
    The intrinsic physical properties and electrical parameters of SiGe and GaAs heterojunction bipolar transistors (HBTs) are compared and discussed. The reported performance of the two devices are comparable. At the same but relatively low current densities, GaAs HBTs are faster than SiGe HBTs. However, SiGe HBTs not using SOI can be designed to operate at much higher current densities by using smaller emitters, resulting in much lower power dissipation and potentially higher performance, but larger substrate-coupling noise, than GaAs HBTs
  • Keywords
    Ge-Si alloys; III-V semiconductors; bipolar integrated circuits; gallium arsenide; heterojunction bipolar transistors; integrated circuit design; integrated circuit noise; semiconductor materials; GaAs; SiGe; bipolar ICs; current densities; electrical parameters; heterojunction bipolar transistors; intrinsic physical properties; power dissipation; substrate-coupling noise; Capacitance; Current density; Dielectric constant; Electron mobility; Gallium arsenide; Germanium silicon alloys; Heterojunction bipolar transistors; Silicon germanium; Silicon on insulator technology; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 1995 4th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    0-7803-3062-5
  • Type

    conf

  • DOI
    10.1109/ICSICT.1995.500188
  • Filename
    500188