Experimental and numerical investigations for CF4 decomposition using RF low pressure plasma

Among perfluorocompounds (PFCs), we focused on CF₄ used in semiconductor manufacturing process which was considered as one of the most difficult to decompose gas. We have investigated the decomposition of CF₄ using the inductively coupled plasma (ICP) reactor with RF power supply. This technology was confirmed to achieve a high efficiency and more economical system in comparison with the conventional system. The reaction products such as CO, CO₂ and COF₂ upon CF₄ decomposition were measured using a CO₂ analyzer and an FTIR. The mechanisms of CF₄ decomposition through the analysis of reaction products and numerical simulations were studied. Numerical simulation was carried out to obtain gas temperature, electron temperature, electron number density and chemical species number density distribution to cope with CF₄ decomposition in the ICP reactor.