• DocumentCode
    1678077
  • Title

    Silicon MOSFETs, the microwave device technology for the 1990s

  • Author

    Camilleri, N. ; Costa, J. ; Lovelace, D. ; Ngo, D.

  • Author_Institution
    Motorola, Tempe, AZ, USA
  • fYear
    1993
  • Firstpage
    545
  • Abstract
    Silicon MOSFET technology using 1.5- mu m gate lengths has demonstrated excellent performance for 900-MHz applications. Circuit results for low-noise amplifiers, power amplifiers, mixers, and oscillators using this technology are discussed in comparison to other device technologies. Device results for 0.6- mu m-gate-length devices showing the microwave performance of silicon MOS transistors are discussed. These results, together with scaling predictions, indicate that microwave silicon MOSFETs will play a major role in the 1990s. The performance of devices with 0.6- mu m gate lengths indicates that silicon MOS will be the FET technology of choice for applications below 3 GHz. Advantages such as high voltage characteristics, low thermal conductivity of silicon, and the high operating junction temperature make silicon MOS a technology with immense potential for high-voltage X-band power applications.<>
  • Keywords
    insulated gate field effect transistors; microwave amplifiers; microwave oscillators; mixers (circuits); power amplifiers; solid-state microwave devices; 0.6 micron; 1.5 micron; 900 MHz to 3 GHz; MOS transistors; MOSFET technology; Si; gate lengths; high operating junction temperature; high voltage characteristics; high-voltage X-band power applications; low thermal conductivity; low-noise amplifiers; microwave device technology; mixers; oscillators; power amplifiers; scaling predictions; Circuits; Low voltage; Low-noise amplifiers; MOSFETs; Microwave FETs; Microwave devices; Microwave oscillators; Microwave technology; Silicon; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium Digest, 1993., IEEE MTT-S International
  • Conference_Location
    Atlanta, GA, USA
  • ISSN
    0149-645X
  • Print_ISBN
    0-7803-1209-0
  • Type

    conf

  • DOI
    10.1109/MWSYM.1993.276880
  • Filename
    276880