Title :
Metal Vapor Vacuum Arc Ion Sources For Implantation And Plasma Processing
Author :
Humphries, S., Jr. ; Lockner, T.R.
Author_Institution :
Arc Engineering
Keywords :
Boron; Cathodes; Ion sources; Plasma applications; Plasma density; Plasma immersion ion implantation; Plasma materials processing; Plasma properties; Plasma sources; Vacuum arcs;
Conference_Titel :
Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on
Conference_Location :
Santa Fe, NM, USA
Print_ISBN :
0-7803-2006-9
DOI :
10.1109/PLASMA.1994.588705
