Title :
Development of a powerful vortex stabilized waterwall flash lamp for RTP applications
Author :
Thrum, T. ; Camm, D. ; Dets, S. ; Hewett, A. ; Rudic, I. ; Stuart, G.C. ; Viel, A.
Author_Institution :
Vortek Industries Ltd., Vancouver, BC, Canada
Abstract :
A 300 mm long flash lamp based on a water-vortex stabilized high-pressure high-power arc lamp has been developed to meet future requirements in semiconductor rapid thermal processing. This flash lamp is much more powerful than any other commercially available flash lamp. Typical operating parameters are peak currents of up to 50 kA and pulse widths in the order of 0.5 to 2 ms FWHM.
Keywords :
arc lamps; flash lamps; rapid thermal processing; semiconductor technology; 0.5 to 2 ms; 300 mm; RTP applications; peak currents; semiconductor rapid thermal processing; water-vortex stabilized high-pressure high-power arc lamp; Annealing; Lamps; Plasma applications; Plasma devices; Plasma temperature; Rapid thermal processing; Silicon; Space vector pulse width modulation; Surface discharges; Switches;
Conference_Titel :
Industry Applications Conference, 2004. 39th IAS Annual Meeting. Conference Record of the 2004 IEEE
Print_ISBN :
0-7803-8486-5
DOI :
10.1109/IAS.2004.1348538
