DocumentCode
1679465
Title
Plasmonic color filters for large area display devices fabricated by laser interference lithography
Author
Do, Yun Seon ; Park, Jung-Ho ; Hwang, Bo Yeon ; Lee, Sung-Min ; Ju, Byeong-Kwon ; Choi, Kyung Cheol
Author_Institution
Dept. of Electr. Eng., KAIST, Daejeon, South Korea
fYear
2012
Firstpage
1
Lastpage
2
Abstract
We demonstrated a plasmonic color filter adopting laser interference lithography technology. Nano scaled hole arrays were obtained with a regular spatial period through the whole glass substrate area of 2.5 cm × 2.5 cm.
Keywords
display devices; nanolithography; optical filters; photolithography; plasmonics; glass substrate; large area display devices; laser interference lithography; nanoscaled hole arrays; plasmonic color filters; regular spatial period; Color; Interference; Lithography; Optical filters; Optical surface waves; Plasmons; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location
San Jose, CA
Print_ISBN
978-1-4673-1839-6
Type
conf
Filename
6326631
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