• DocumentCode
    1679465
  • Title

    Plasmonic color filters for large area display devices fabricated by laser interference lithography

  • Author

    Do, Yun Seon ; Park, Jung-Ho ; Hwang, Bo Yeon ; Lee, Sung-Min ; Ju, Byeong-Kwon ; Choi, Kyung Cheol

  • Author_Institution
    Dept. of Electr. Eng., KAIST, Daejeon, South Korea
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We demonstrated a plasmonic color filter adopting laser interference lithography technology. Nano scaled hole arrays were obtained with a regular spatial period through the whole glass substrate area of 2.5 cm × 2.5 cm.
  • Keywords
    display devices; nanolithography; optical filters; photolithography; plasmonics; glass substrate; large area display devices; laser interference lithography; nanoscaled hole arrays; plasmonic color filters; regular spatial period; Color; Interference; Lithography; Optical filters; Optical surface waves; Plasmons; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2012 Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4673-1839-6
  • Type

    conf

  • Filename
    6326631