DocumentCode :
1680932
Title :
A Non-Oxide 850 nm VCSEL for High-Speed Datacom Applications
Author :
Ayliffe, M. ; Cheng, M. ; Chirovsky, L.M.F. ; Ciesla, C. ; Demars, S. ; Hart, C. ; Hasnain, G. ; Hogan, W. ; Hu, S.Y. ; Jackson, K.P. ; Jiang, W. ; Lewis, D. ; Murty, M. V Ramana ; Shieh, C.L. ; Sun, D.C. ; Tan, I.-H. ; Venables, D.
Author_Institution :
JDSU, San Jose
fYear :
2007
Firstpage :
1
Lastpage :
3
Abstract :
We have developed an 850 nm VCSEL where current and photon confinement is achieved by a mesa structure without lateral oxidation. The VCSEL performance and reliability is discussed in the context of 4xFC and 10 GbE applications.
Keywords :
optical fibre communication; surface emitting lasers; VCSEL; high-speed datacom applications; mesa structure; non-oxide VCSEL; photon confinement; size 850 nm; Application software; Distributed Bragg reflectors; Etching; Fiber lasers; Monitoring; Oxidation; Surface emitting lasers; Temperature; Testing; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Fiber Communication and the National Fiber Optic Engineers Conference, 2007. OFC/NFOEC 2007. Conference on
Conference_Location :
Anaheim, CA
Print_ISBN :
1-55752-831-4
Type :
conf
DOI :
10.1109/OFC.2007.4348583
Filename :
4348583
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1680932
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