Title :
Measurement of Inductive Coupling Effect on Timing in 90nm Global Interconnects
Author :
Ogasahara, Yasuhiro ; Hashimoto, Masanori ; Onoye, Takao
Author_Institution :
Dept. of Inf. Syst. Eng., Osaka Univ., Suita
Abstract :
Inductive coupling is becoming a design concern for global interconnects in nano-meter technology. This paper shows measurement results of inductive coupling effect on timing, and reveals that inductive coupling noise is a practical design issue in 90nm technology. The measured delay change curve is consistent with circuit simulation results with RLC interconnect model, and definitely different from those of conventional RC model. Long-range effect and noise reduction by ground insertion are clearly observed on silicon
Keywords :
circuit simulation; coupled circuits; integrated circuit interconnections; timing; 90 nm; RLC interconnect model; circuit simulation; global interconnects; inductive coupling effect measurement; nanometer technology; timing; Circuit noise; Circuit simulation; Coupling circuits; Crosstalk; Impedance; Integrated circuit interconnections; Noise measurement; RLC circuits; Semiconductor device measurement; Timing;
Conference_Titel :
Custom Integrated Circuits Conference, 2006. CICC '06. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
1-4244-0075-9
Electronic_ISBN :
1-4244-0076-7
DOI :
10.1109/CICC.2006.320924
