Title :
Parametric Studies Of Electron-energy -distribution-function And Rate Constants For Plasma-etching Reactors
Author :
Shon, J.W. ; Meeks, E. ; Kee, R.J.
Author_Institution :
Sandia National Laboratories
Keywords :
Antenna measurements; Apertures; Electrons; Helical antennas; Inductors; Laboratories; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements;
Conference_Titel :
Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on
Conference_Location :
Santa Fe, NM, USA
Print_ISBN :
0-7803-2006-9
DOI :
10.1109/PLASMA.1994.588746
