Title :
Design Considerations For Inductively Coupled Plasma Etching Reactors
Author :
Ventzek, P.L.G. ; Hoekstra, R.J. ; Grapperhaus, M. ; Kushner, M.J.
Author_Institution :
University of Illinois
Keywords :
Current measurement; Etching; Inductors; Nuclear and plasma sciences; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources; Pulse measurements;
Conference_Titel :
Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on
Conference_Location :
Santa Fe, NM, USA
Print_ISBN :
0-7803-2006-9
DOI :
10.1109/PLASMA.1994.588789
