DocumentCode
1684902
Title
Design Considerations For Inductively Coupled Plasma Etching Reactors
Author
Ventzek, P.L.G. ; Hoekstra, R.J. ; Grapperhaus, M. ; Kushner, M.J.
Author_Institution
University of Illinois
fYear
1994
Firstpage
109
Lastpage
109
Keywords
Current measurement; Etching; Inductors; Nuclear and plasma sciences; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources; Pulse measurements;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on
Conference_Location
Santa Fe, NM, USA
ISSN
0730-9244
Print_ISBN
0-7803-2006-9
Type
conf
DOI
10.1109/PLASMA.1994.588789
Filename
588789
Link To Document