Title :
Chemical Etching Of SiO/sub 2/ By CF/sub 4/ At Low Pressure- Does It Really Depend On The Plasma Chemistry?
Author :
Hershkowitz, N. ; Ding, J. ; Jenq, J.
Author_Institution :
University of Wisconsin
Keywords :
Channel hot electron injection; Chemicals; Etching; Inductors; Magnetic field measurement; Plasma applications; Plasma chemistry; Plasma diagnostics; Plasma measurements; Plasma properties;
Conference_Titel :
Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on
Conference_Location :
Santa Fe, NM, USA
Print_ISBN :
0-7803-2006-9
DOI :
10.1109/PLASMA.1994.588793
