DocumentCode
1685775
Title
IF polyphase filter design and calibration with back-gate biasing in 28 nm FD-SOI technology
Author
Derlecki, Mariusz ; Borejko, Tomasz ; Pleskacz, Witold A.
Author_Institution
Inst. of Microelectron. & Optoelectron., Warsaw Univ. of Technol., Warsaw, Poland
fYear
2015
Firstpage
334
Lastpage
338
Abstract
This paper presents a sixth-order IF polyphase band-pass filter design in 28 nm FD-SOI technology. This filter has been synthesized from a low-pass Butterworth filter prototype. The filter´s bandwidth is 1.2 MHz and its center frequency is 2 MHz. A calibration technique using back-gate biasing that is available in fully depleted SOI to minimize the mismatch impact, has been also described. The two filters have been designed using two different types of transistors (regular P/NMOS and flip-well P/NMOS). The power consumption is 1.4 mW. The simulation results of the designed filter have also been presented in this paper.
Keywords
Butterworth filters; band-pass filters; calibration; low-pass filters; silicon-on-insulator; FD-SOI technology; IF polyphase filter design; P/NMOS; back-gate biasing; bandwidth 1.2 MHz; calibration technique; frequency 2 MHz; low-pass Butterworth filter prototype; power 1.4 mW; sixth-order IF polyphase band-pass filter; size 28 nm; transistors; 28 nm FD-SOI; Gm-C structure; Polyphase filter; back-gate biasing;
fLanguage
English
Publisher
ieee
Conference_Titel
Mixed Design of Integrated Circuits & Systems (MIXDES), 2015 22nd International Conference
Conference_Location
Torun
Print_ISBN
978-8-3635-7806-0
Type
conf
DOI
10.1109/MIXDES.2015.7208538
Filename
7208538
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