Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation

Author

Booske, John H. ; Zhan, Li ; Cooper, R.F. ; Shohet, J.L. ; Shenai, Krishna ; Dallman, D. ; Goeckner, M.J. ; Breun, R. ; Hitchon, William N. G. ; Wickesberg, E. ; Speth, R. ; Jacobs, J.R. ; Was, G.

Author_Institution

University of Wisconsin

fYear

1994

Firstpage

166

Lastpage

166

Keywords

CMOS technology; Ceramics; DNA; Electron beams; Flue gases; Glass; Ion implantation; Plasma sources; Silicon; Surface treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on

Conference_Location

Santa Fe, NM, USA

ISSN

0730-9244

Print_ISBN

0-7803-2006-9

Type

DOI

10.1109/PLASMA.1994.588985

Filename

588985

Link To Document