Title :
Comparison Of Etch Performance In The Gec Referxmce Cdl With A Cqmmemial Etcher
Author :
Pender, J. ; Buie, M. ; Brake, M. ; Elta, M.
Author_Institution :
University of Michigan
Keywords :
Aluminum; Argon; Electrodes; Etching; Fault location; Ion sources; Masers; Plasma applications; Resonance; Voltage;
Conference_Titel :
Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on
Conference_Location :
Santa Fe, NM, USA
Print_ISBN :
0-7803-2006-9
DOI :
10.1109/PLASMA.1994.589008
