DocumentCode :
1691366
Title :
High performance Pch-LDMOS transistors in wide range voltage from 35V to 200V SOI LDMOS platform technology
Author :
Shimamoto, Satoshi ; Yanagida, Yohei ; Shirakawa, Shinji ; Miyakoshi, Kenji ; Imai, Toshinori ; Oshima, Takayuki ; Sakano, Junichi ; Wada, Shinichiro
Author_Institution :
Micro Device Div., Hitachi, Ltd., Tokyo, Japan
fYear :
2011
Firstpage :
44
Lastpage :
47
Abstract :
We have developed high performance Pch-LDMOS transistors in wide range rated voltage from 35V to 200V SOI LDMOS platform technology. By applying a novel channel structure, a high saturation drain current of 172 μA/μm in the 200V Pch-LDMOS transistor was achieved, which is comparable to that of the Nch-LDMOS transistor. A low on-resistance of 3470 mΩ*mm2 was obtained while maintaining high on- and off-state breakdown voltages of -240 and -284 V. The 35V to 200V LDMOS transistors with a competitive low on-resistance were also demonstrated by layout optimization such as RESURF structure and field plate.
Keywords :
MOSFET; optimisation; silicon-on-insulator; RESURF structure; SOI LDMOS platform technology; field plate; high performance Pch-LDMOS transistors; high saturation drain current; novel channel structure; optimization; voltage 35 V to 200 V; wide range voltage; Harmonic analysis; Imaging; Ion implantation; Layout; Logic gates; Stress; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs (ISPSD), 2011 IEEE 23rd International Symposium on
Conference_Location :
San Diego, CA
ISSN :
1943-653X
Print_ISBN :
978-1-4244-8425-6
Type :
conf
DOI :
10.1109/ISPSD.2011.5890786
Filename :
5890786
Link To Document :
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