Title :
Modeling and analysis of temperature dependence of the concentration and mobility of charge carriers in SiC layers. Determination of the compensation ratio
Author_Institution :
Lab. de Phys., CNRS, Grenoble, France
Abstract :
Expressions for computing the carrier concentration and mobility as a function of temperature previously derived have been used for SiC layers. Groups of curves obtained for various parameters of this material illustrate the analysis presented. These curves give carrier concentration and mobility-versus-temperature data, and liquid-nitrogen carrier mobility versus compensation ratio data, for n- and p-type layers. A practical method of determination of the degree of compensation is proposed from Hall effect measurements at 300 K and 77 K. To verify these calculations, examples of determination of SiC layer parameters are shown, as well as a fitting of experimental mobility curves over the entire temperature range 30 K-450 K
Keywords :
Hall effect; carrier density; carrier mobility; semiconductor materials; silicon compounds; 30 to 450 K; Hall effect; SiC; charge carrier concentration; charge carrier mobility; compensation ratio; n-type layers; p-type layers; temperature dependence; Charge carrier density; Charge carriers; Chemical technology; Effective mass; Electrons; Hall effect; Silicon carbide; Substrates; Temperature dependence; Temperature distribution;
Conference_Titel :
Microelectronics, 1995. Proceedings., 1995 20th International Conference on
Conference_Location :
Nis
Print_ISBN :
0-7803-2786-1
DOI :
10.1109/ICMEL.1995.500844