• DocumentCode
    1692278
  • Title

    Using fuzzy mathematics to detect dimple defects of polished wafer surface

  • Author

    Lin, Jen Chung ; Li, Hua ; Ji, Yuandong

  • Author_Institution
    Coll. of Eng., Texas Tech Univ., Lubbock, TX, USA
  • fYear
    1991
  • Firstpage
    187
  • Lastpage
    191
  • Abstract
    Using the concept of fuzzy mathematics, the authors developed an automated visual inspection system to detect dimple defects of polished wafer surfaces. The algorithm consists of two major processing phases. At the first phase, pre-processing is performed to eliminate noise and to reduce the number of potential candidates of dimple defects. At the second phase, four pattern features are defined based on the consideration of scale-, position-, and orientation-invariant. A fuzzy membership function is utilized to cope with the wide range of shape variations of the dimple defects. A decision-making mechanism is based on the value of the membership function which describes the pattern´s closeness to a dimple. The attractive features of the system include the fact that the algorithm is distortion-invariant. Experimental results are presented
  • Keywords
    automatic optical inspection; computer vision; computerised pattern recognition; fuzzy logic; integrated circuit testing; algorithm; automated visual inspection system; decision-making mechanism; dimple defects; distortion-invariant; fuzzy mathematics; fuzzy membership function; orientation-invariant; pattern features; polished wafer surface; position invariant; pre-processing; scale-invariant; shape variations; Application software; Electronics industry; Humans; Inspection; Mathematics; Noise shaping; Nonlinear distortion; Robotic assembly; Semiconductor device noise; Shape;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Manufacturing Technology Symposium, 1991., Eleventh IEEE/CHMT International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    0-7803-0155-2
  • Type

    conf

  • DOI
    10.1109/IEMT.1991.279774
  • Filename
    279774