DocumentCode
1692278
Title
Using fuzzy mathematics to detect dimple defects of polished wafer surface
Author
Lin, Jen Chung ; Li, Hua ; Ji, Yuandong
Author_Institution
Coll. of Eng., Texas Tech Univ., Lubbock, TX, USA
fYear
1991
Firstpage
187
Lastpage
191
Abstract
Using the concept of fuzzy mathematics, the authors developed an automated visual inspection system to detect dimple defects of polished wafer surfaces. The algorithm consists of two major processing phases. At the first phase, pre-processing is performed to eliminate noise and to reduce the number of potential candidates of dimple defects. At the second phase, four pattern features are defined based on the consideration of scale-, position-, and orientation-invariant. A fuzzy membership function is utilized to cope with the wide range of shape variations of the dimple defects. A decision-making mechanism is based on the value of the membership function which describes the pattern´s closeness to a dimple. The attractive features of the system include the fact that the algorithm is distortion-invariant. Experimental results are presented
Keywords
automatic optical inspection; computer vision; computerised pattern recognition; fuzzy logic; integrated circuit testing; algorithm; automated visual inspection system; decision-making mechanism; dimple defects; distortion-invariant; fuzzy mathematics; fuzzy membership function; orientation-invariant; pattern features; polished wafer surface; position invariant; pre-processing; scale-invariant; shape variations; Application software; Electronics industry; Humans; Inspection; Mathematics; Noise shaping; Nonlinear distortion; Robotic assembly; Semiconductor device noise; Shape;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Manufacturing Technology Symposium, 1991., Eleventh IEEE/CHMT International
Conference_Location
San Francisco, CA
Print_ISBN
0-7803-0155-2
Type
conf
DOI
10.1109/IEMT.1991.279774
Filename
279774
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