DocumentCode :
1693025
Title :
GaN based Super HFETs over 700V using the polarization junction concept
Author :
Nakajima, Akira ; Dhyani, Mahesh H. ; Narayanan, E. M Sankara ; Sumida, Yasunobu ; Kawai, Hiroji
Author_Institution :
Dept. of EEE, Univ. of Sheffield, Sheffield, UK
fYear :
2011
Firstpage :
280
Lastpage :
283
Abstract :
GaN Super Heterojunction Field Effect Transistors (Super HFETs) based on the polarization junction (PJ) concept are demonstrated on Sapphire substrates. These Super HFETs were fabricated from a GaN/Al0.23Ga0.77N/GaN hetero structure with 2D hole and electron gas densities of 1.1×1013 and 9.7×1012 cm-2 at the respective hetero-interfaces. The Super HFETs show breakdown voltage above 700 V with on-resistances of 15 Ω·mm. In addition, the super HFETs have inherent body diodes and its reverse conducting characteristics are demonstrated.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; power HEMT; two-dimensional electron gas; wide band gap semiconductors; 2D electron gas density; 2D hole gas density; Al2O3; GaN-Al0.23Ga0.77N-GaN; polarization junction concept; sapphire substrates; super HFET; super heterojunction field effect transistors; Aluminum gallium nitride; Electrodes; Gallium nitride; HEMTs; Logic gates; MODFETs; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs (ISPSD), 2011 IEEE 23rd International Symposium on
Conference_Location :
San Diego, CA
ISSN :
1943-653X
Print_ISBN :
978-1-4244-8425-6
Type :
conf
DOI :
10.1109/ISPSD.2011.5890845
Filename :
5890845
Link To Document :
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