DocumentCode :
1693048
Title :
Modeling and analysis of dual-arm cluster tools for wafer fabrication with revisiting
Author :
Qiao, Yan ; Wu, NaiQi ; Zhou, MengChu
Author_Institution :
Dept. of Ind. Eng., Guangdong Univ. of Technol., Guangzhou, China
fYear :
2011
Firstpage :
90
Lastpage :
95
Abstract :
Some wafer fabrication processes are repeated processes, e.g. atomic layer deposition (ALD) process. For such processes, the wafers need to visit some processing modules for a number of times, which complicates the cycle time analysis. This paper studies the cycle time analysis problem for such processes. With a Petri net model, it is found that such processes contain local cycles involving only the revisiting PMs and global cycles involving both revisiting and non-revisiting PMs. The process switches between these two types of cycles such that the process never reaches a steady state. Based on this finding, the mechanism underlying such processes is revealed and analytical expressions are given for the calculation of their cycle time. Illustrative examples are presented to show the application of the proposed approach.
Keywords :
Petri nets; industrial manipulators; machine tools; semiconductor device manufacture; semiconductor industry; Petri net model; atomic layer deposition process; cycle time analysis; dual-arm cluster tool; processing module revisiting; repeated process; wafer fabrication process; Analytical models; Fabrication; Load modeling; Robots; Schedules; Semiconductor device modeling; System recovery;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Automation Science and Engineering (CASE), 2011 IEEE Conference on
Conference_Location :
Trieste
ISSN :
2161-8070
Print_ISBN :
978-1-4577-1730-7
Electronic_ISBN :
2161-8070
Type :
conf
DOI :
10.1109/CASE.2011.6042403
Filename :
6042403
Link To Document :
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